光刻工艺培训--喷胶状态调整-.pptx
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1、Dispense adjustmentpanc1Resist Dispense ParameterCoating process parameterPump Air-operator valveResist 2May 24Coating Process ParameterResist DispenseResist TemperatureResist Dispense systemPump type(pneumatic/motor driven,single/double stage)Resist Filter(material,type,pore size)Dispense line(leng
2、th,diameter,material,nozzle diameter)Resist DispenseResist Dispense VolumeResist Dispense RateDispense Pump adjustmentMotor Flange Temperature3May 24Resist TemperatureOld style water jackedNew style water jackedResist temperature measurement at nozzle block possibleResist temperature measurement at
3、nozzle block shows large error4May 24Resist TemperatureResist Temperature influence on uniformitymajor parameter to adjust coating uniformityrecommended setting range:21.0-24.0Cbest temperatures of different Resists at same track should be as close as possible(temperature settling time between two r
4、ecipes)inside water jacked are just 7 cc of resist(no multiple dummy dispense before process start)Resist temperature Calibrationcalibration needs to be done regularly(every 3-6 month)watch for right measurement position(old and new style)Resist DispenseA low resist temperature will cause an additio
5、nal suckback due to contraction of resist(adjust low initial suckback)A high Resist temperature will cause a dripping of Resist due to expansion of Resist(adjust a high initial suckback)5May 24Resist Dispense System-Pump typePneumatic driven Pumpsalready since long time in usenot for low dispense vo
6、lumeslimited dispense volume repeatabilityno good dispense rate controllow investment costsIWAKI SB pumpMILLIPORE WCDS/WCDP pumpIDI PumpStepper Motor driven Pumpscan control low dispense volumegood to excellent dispense volume repeatabilitycan control low dispense rateshigh investment costIWAKI FT 1
7、00-1 pumpCYBOR 5120 pumpMILLIPORE GEN2MILLIPORE IntelliGENTEL RDS pump6May 24Resist Dispense System-Pump typeSingle Stage PumpsResist is dispensed through the filterDispense rate=filtration ratepoor dispense rate controlhigh stress on the ResistDispense start and shut off problemsproblems with high
8、viscosity Resistair vent after filter difficultlow recovery timeless expensiveall pneumatic driven pumpsCYBOR 5120IWAKI FT 100-1Double Stage PumpsFirst stage pump filters the ResistSecond stage pump dispenses ResistFiltration rate independent from dispense ratelow stress on the Resistexcellent dispe
9、nse rate control(multi rate possible)extended filter life timereduced maintenance requirementsefficient air vent includedlong recovery timesexpensiveMILLIPORE GEN2MILLIPORE IntelliGENMILLIPORE Photo250TEL RDS7May 24Resist Dispense System-Pump typeMillipore IntelliGENMillipore GEN2Millipore WCDSCYBOR
10、 5120IDI 4008May 24Resist Dispense System-window of operation9May 24Resist Dispense System-Resist FilterNo Filtrationfor high viscosity Resist and Polyimidevery low stress dispenseLow COOMembrane Filtertoday mostly usedpore size and number of stacks depend on application(viscosity)membrane made from
11、 PTFE(some UPE)sometimes levelling agents first need to cover filter surface after installation(striations for 24h)PTFE filter need prewet with solvent prior to the use with ResistHollow Fibre Filterrelatively new on the markedno prewet necessaryfilter material:UPEnot yet tested for all chemicalsno
12、experience with high viscosity ResistFilter live timedepend on used Resist(type and supplier quality)depend on used filter typedepend on used Pump typecontinuous(daily/weekly particle check is recommended)10May 24Resist Dispense System-Resist FilterSpontaneous Wettability of Typical Photochemical Fi
13、lters11May 24Resist Dispense System-Dispense lineDispense line lengthas short as possiblelength in water jacked app 1mlimits maximum of applicable Resist Viscosity Dispense line inner diametermust fit to the applied resist viscosityif too small too large pressure dropif too large problems with air b
14、ubblesTEL standard:3.2 mm(3.0 mm in water jacked)replace damaged tubes!12May 24Resist Dispense System-Dispense lineDispense line assemblyline must be assembled straight upward(no ups and downs,no horizontal loops)if possible shorten dispense lineDispense line materialTEL standard:ultra pure PFAResis
15、t nozzleTEL standard Nozzle diameter:2.0 mm1.5 mm nozzles for low viscosity resists applicablewatch for nozzle cleanness(dummy dispense)watch for nozzle damages(nozzle is consumable)if comets on wafer first check the resist nozzle13May 24Resist Dispense VolumeMinimum Dispense Volume to cover the waf
16、er and to achieve a good coating uniformity depends on:wafer sizeResist volume remaining on wafer at 1.0 m thickness150mm wafer:0.016cc200mm wafer:0.028cc300mm wafer:0.063ccResist viscosityResist solventPattern topographyLayer surface tension Process know howuniformity requirementsResist pump capabi
17、lities Currently used Dispense volumes for“1m Resists”14May 24Resist Dispense VolumeDry patch caused by:too low resist volumetoo low dispense ratetoo low dispense spin speedtoo low surface tension of substratetoo high surface tension of Resisttoo high pattern topography15May 24Resist Dispense RateDi
18、spense Rate=Dispense Volume/Dispense TimeDispense Rate highupsbetter surface coverageeasier control of dispense shut offdowns Dispense time lowdifficult to control uniformity on wafer(high dispense spin speed required)Dispense Rate lowupsDispense time higheasier control of uniformity on waferdownsdi
19、fficult to control dispense shut offsurface coverage difficult(high dispense spin speed required)16May 24Dispense RateDispense Rate depend on:Dispense volumevolume is chosen firstis calculated from volume and timeDispense timedispense time is chosen according to uniformity requirementsWafer wafer si
20、zewafer surface tensionpattern topographyTechnical limitationminimum:lowest rate which pump can supportmaximum:highest rate which pump can support&highest possible filter pressure(single stage pumps)Limitations by the used Resistminimum:dispense splits into droplets(depend on the surface tension of
21、the Resist)maximum:highest stress which the Resist can withstand(without cavitations and outgassing)Resist viscosity,surface tension,solvent system17May 24Resist Dispense adjustmentResist Dispense Parameter should be:Adjustable(parameter are“normal”)Reproducible(parameter are“known”)Critically are(i
22、ndependent of pump type):adjustment of dispense startadjustment of dispense rateadjustment of dispense shut offadjustment of suckback volumeadjustment of suckback speedHow to adjust the dispense:dispense into glass cylinder with app.45 angledroplet at dispense start or at dispense end will be easier
23、 visiblevariations in dispense rate will be visibleuse high speed camera(extremely expensive)18May 24Dispense Adjustment GEN2&IntelliGEN pumpPump PreparationBefore first usefill the dispense system with Resist(no filter prewet necessary)use the following pump parameter for filling:Dispense Volume:6.
24、0 ccDispense Rate:1.5 cc/secPurge Volume:0.2 ccPurge Rate:0.5 cc/secVent Time:0.4 secwhen the pump is filled prime the system 50 times with the following parameter:Dispense Volume:1.5 ccDispense Rate:0.5 cc/secPurge Volume:5.0 ccPurge Rate:1.0 cc/secVent Time:2.0 secpurge the system by running the f
25、ill recipe another 50 times19May 24Dispense Adjustment GEN2&IntelliGEN pumpPump PreparationChange of Resistempty the system and change the filterif the old Resist is not compatible with the solvent of the new Resist empty the system and purge it first(before filter change)with the thinner of the old
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- 光刻 工艺 培训 胶状 调整
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